Advanced UV-LED Exposure Systems for Photolithography Applications
Semiconductor and PCB manufacturers use high-power radiation in the near UV (NUV) spectral ranges (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm) to create complex microstructures in photolithography processes. This serves to produce everything from robust integrated circuits (ICs), power devices, compound semiconductors (LEDs, laser diodes, PV cells), MEMS, and microfluidic systems to 3D and advanced packaging.
For decades, the only alternative was to use mercury discharge lamps for broadband UV exposure equipment. Recent advances in UV-LED have changed that. This technology is safer, far more affordable, and more reliable than conventional lamps. And we have a convenient option if you want to retrofit legacy UV exposure production tools or design new ones: Simply integrate Primelite’s Advanced UV-LED Light Engines as a subsystem.
UV-LED Mask Aligners
Mask aligners equipped with our UV-LED Light Engines deliver superior results for proximity and contact (soft / hard / vacuum) exposure use cases.
UV-LED Wafer Steppers
With a Primelite UV-LED Exposure System integrated into your Stepper, you can target resolutions down to 1 µm or even in the sub-micron range.
UV-LED Direct Imaging
DMD / DLP® projection systems in HVM environments need high-performance UV light sources. We offer the most capable UV-LED DMD Illuminator on the market.
UV-LED Wafer Edge Exposure
The go-to solutions for wafer edge exposure, Primelite’s UV-LED spot light sources are perfect matches for mercury arc lamps’ i-, h-, and g-line output.
UV-LED Collimated Exposure
Conventional flood exposure lamps are on their way out. Systems are much safer, more affordable, and more reliable with our broadband UV-LED light sources.>
UV-LED Photomask Inspection
Say goodbye to mercury arc lamps in your photomask inspection equipment and hello to our fiber-coupled UV-LED Exposure Systems.