Primelite Lithography UV-LED Exposure System ALE ONE C
Primelite Lithography UV-LED Exposure System ALE/1C (Controller and Exposure Subsystem)

ALE/1C UV-LED exposure systems deliver broadband (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm) output matching the illumination power of conventional mercury arc lamps between 1 and 2 kW.

A small footprint exposure unit combined with a separate control subsystem allows easy integration of our UV-LED light sources into your equipment. Our ALE/1C UV-LED exposure systems predominantly replace discharge lamps in semiconductor photolithography applications.

For more information, see Advanced UV-LED Light Engine ONE C (ALE/1C).