Lithography UV-LED Exposure Systems

Our UV-LED Exposure Systems Deliver Output Power Levels Equivalent to
Mercury Arc Lamps of up to 5 kW.

Primelite’s Advanced UV-LED Light Sources for Lithography Applications

Explore our high-performance UV-LED Lithography Exposure Systems and precision curing solutions for the near UV (NUV) spectral ranges (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm). Our products perform exceptionally well in Mask Aligners for wafers up to 12″ (300 mm), Wafer Steppers, large-substrate flood exposure equipment, and Nanoimprint Lithography (NIL) tools. Another target application is  DMD / DLP® projection in high-power maskless Direct Imagers.

Primelite’s Advanced UV-LED Light Engines are the reliable tools of choice in low- and high-volume manufacturing environments. Consider our industry-proven UV-LED light sources whether you are designing new exposure systems or looking for an alternative illumination solution to conventional mercury discharge lamps for retrofitting purposes.

Advanced Light Engine

Primelite Lithography UV-LED Advanced Light Engine ONE C

Mask Aligners using our UV-LED Light Engines have proven to produce superior results in contact and proximity exposure applications. 

Advanced Light Engine

Expose at 100 mW/cm2 and beyond on round and square 8″ or 12″ substrates using an i-line or broadband ALE/2 UV-LED Light Engine configuration.

DLP®/DMD Illuminator

DMD / DLP® projection systems in HVM environments need high-performance UV light sources. We offer the most capable UV-LED DMD Illuminator available. 

Are you ready for UV-LED exposure?