Our UV-LED Exposure Systems Deliver Output Power Levels Equivalent to
Primelite’s Advanced UV-LED Light Sources for Lithography Applications
Explore our high-performance UV-LED Lithography Exposure Systems and precision curing solutions for the near UV (NUV) spectral ranges (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm). Our products perform exceptionally well in Mask Aligners for wafers up to 12″ (300 mm), Wafer Steppers, large-substrate flood exposure equipment, and Nanoimprint Lithography (NIL) tools. Another target application is DMD / DLP® projection in high-power maskless Direct Imagers.
Primelite’s Advanced UV-LED Light Engines are the reliable tools of choice in low- and high-volume manufacturing environments. Consider our industry-proven UV-LED light sources whether you are designing new exposure systems or looking for an alternative illumination solution to conventional mercury discharge lamps for retrofitting purposes.
Advanced Light Engine
ONE C
Mask Aligners using our UV-LED Light Engines have proven to produce superior results in contact and proximity exposure applications.
Advanced Light Engine
TWO
Expose at 100 mW/cm2 and beyond on round and square 8″ or 12″ substrates using an i-line or broadband ALE/2 UV-LED Light Engine configuration.
UV-LED
DLP®/DMD Illuminator
DMD / DLP® projection systems in HVM environments need high-performance UV light sources. We offer the most capable UV-LED DMD Illuminator available.