Lithography UV-LED Exposure Systems

Our UV-LED Exposure Systems Deliver Output Power Levels Equivalent to
Mercury Arc Lamps of up to 5 kW.

Primelite’s Advanced UV-LED Light Sources for Lithography Applications

Explore our high-performance UV-LED Lithography Exposure Systems and precision curing solutions for the near UV (NUV) spectral ranges (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm). Our products perform exceptionally well in Mask Aligners for wafers up to 12″ (300 mm), Wafer Steppers, large-substrate flood exposure equipment, and Nanoimprint Lithography (NIL) tools. Another target application is  DMD / DLP® projection in high-power maskless Direct Imagers.

Primelite’s Advanced UV-LED Light Engines are the reliable tools of choice in low- and high-volume manufacturing environments. Consider our industry-proven UV-LED light sources whether you are designing new exposure systems or looking for an alternative illumination solution to conventional mercury discharge lamps for retrofitting purposes.

Advanced Light Engine
ONE C

Primelite Lithography UV-LED Advanced Light Engine ONE C

Mask Aligners using our UV-LED Light Engines have proven to produce superior results in contact and proximity exposure applications. 

Advanced Light Engine
TWO

Expose at 100 mW/cm2 and beyond on round and square 8″ or 12″ substrates using an i-line or broadband ALE/2 UV-LED Light Engine configuration.

UV-LED
DLP®/DMD Illuminator

DMD / DLP® projection systems in HVM environments need high-performance UV light sources. We offer the most capable UV-LED DMD Illuminator available. 

Are you ready for UV-LED exposure?