We have designed our ALE/2 UV-LED exposure systems to substitute conventional mercury discharge lamp technology in the range of 2 to 5 kW. Monospectral (i-line only, CWL 365 nm) or multispectral broadband (i-line, CWL 365 nm/h-line, CWL 405 nm/g-line, CWL 436 nm) output configurations are available, achieving intensities beyond 100 mW/cm2 on round and square 8″ or 12″ substrates.
Our UV-LED photolithography light source ALE/2 combines an exposure subsystem and a separate control subsystem. The compact size of the UV-LED exposure subsystem makes direct integration into your litho tool a very manageable task.
For more information, see Advanced UV-LED Light Engine TWO (ALE/2).